Influence of dry etching condition to geometry of vertically aligned silicon nanostructures
نویسندگان
چکیده
منابع مشابه
Dry Etching Based Silicon Micromachining
The aim of this work is to demonstrate the “dry” etching based micro-fabrication technologies in the manufacturing of Single Crystal Silicon (SCS) for Micro-Electro/(Optical)-Mechanical-Systems (ME(O)MS). The ME(O)MS technology is very fast growing industry branch based often on the same silicon technology as integrated circuits. The process of plasma-dry etching is quite simple straightforward...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2017
ISSN: 1742-6588,1742-6596
DOI: 10.1088/1742-6596/917/5/052030